SAM Sputter Targets: Will the grain size and crystal orientation affect the quality of the sputtering targets?

5 days ago, Tue, Oct 16, 2018, 07:40:34
Among the targets of the same composition, the target having a smaller grain size has a faster deposition rate than the target having a larger grain size. In addition to affecting the sputtering rate, the size of the grain size also affects the quality of the obtained film. If the grain size is too large and the sputtering time is short, the film layer may be poorly densified, resulting in oxidative release of the surface of the coated product.

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